Independent R&D Capabilities: In collaboration with Nanjing University, we developed "ultra-pure electronic-grade hydrofluoric acid preparation technology," utilizing a multi-stage distillation-ion exchange-ultrafiltration process, coupled with an online metal ion monitoring system, to achieve a purity level of ppb (≤1 ppb), meeting the cleaning requirements for chips below 14nm. This technology has obtained 20 international invention patents, covering major semiconductor markets such as the United States, Japan, and South Korea, and participated in the formulation of the national standard for "Electronic Grade Hydrofluoric Acid" (GB/T 31368-2015). The technological achievements are applied in the production lines of top international semiconductor companies such as TSMC and Samsung.